Film deposition and processing of materials
Laser deposition of films of various materials on substrates with the necessary temperature and vacuum conditions in the vacuum coating chamber in the temperature range 20-1100 ° C, a vacuum of up to 100 uPa. Computer control of temperature and time regimes postrostovogo annealing.
Laser materials processing powerful nanosecond radiation for the purpose of structural modification, cleaning, etc.
Powerful pulsed laser for the cultivation and processing of film materials.
Samples of thin films on dielectric substrates.